MASKLESS WRITING OF A WORKPIECE USING A PLURALITY

专利名称：MASKLESS WRITING OF A WORKPIECE

USING A PLURALITY OF EXPOSURESHAVING DIFFERENT FOCAL PLANES USINGMULTIPLE DMDS

发明人：Per Askebjer,Mats Rosling申请号：US14011725申请日：20130827

公开号：US20140053399A1公开日：20140227

专利附图：

摘要：The technology disclosed relates to accommodating embedded substrates

during direct writing onto a printed circuit board and to other patterning problems thatbenefit from an extended depth of focus. In particular, it relates to multi-focus directwriting of a workpiece by the continuous or step-wise movement of the workpiece duringthe sequence of exposures having different focus planes. In one implementation, a multi-arm rotating direct writer is configured for interleaved writing focused on two or morefocal planes that generally correspond to two or more surface heights of a radiationsensitive layer that overlays the uneven workpiece. Alternating arms can produceinterleaved writing to the two or more focal planes.

申请人：Micronic Mydata AB

地址：Taby SE

国籍：SE

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