专利名称：Apparatus for controlling and/or measuring
additive concentration in an electroplatingbath
发明人：Lyndon W. Graham,Thomas C.
Taylor,Thomas L. Ritzdorf,Fredrick A.Lindberg,Bradley C. Carpenter
申请号：US10372955申请日：20030226公开号：US07229543B2公开日：20070612
专利附图：
摘要：A method for measuring a target constituent of an electroplating solution usingan electroanalytical technique is set forth in which the electroplating solution includesone or more constituents whose by-products skew an initial electrical response to anenergy input of the electroanalytical technique. The method comprises a first step inwhich an electroanalytical measurement cycle of the target constituent is initiated byproviding an energy input to a pair of electrodes disposed in the electroplating solution.The energy input to the pair of electrodes is provided for at least a predetermined timeperiod corresponding to a time period in which the electroanalytical measurement cyclereaches a steady-state condition. In a subsequent step, an electroanalytical measurementof the energy output of the electroanalytical technique is taken after theelectroanalytical measurement cycle has reached the steady-state condition. Theelectroanalytical measurement is then used to determine an amount of the targetconstituent in the electroplating solution. An automatic dosing system that includes theforegoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.
申请人：Lyndon W. Graham,Thomas C. Taylor,Thomas L. Ritzdorf,Fredrick A.Lindberg,Bradley C. Carpenter
地址：Kalispell MT US,Kalispell MT US,Bigfork MT US,Hungry Horse MT US,Austin TXUS
国籍：US,US,US,US,US
代理机构：Edell Shapiro & Finnan, LLC
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