专利名称：STRUCTURES AND STRUCTURE FORMING
METHODS
发明人：JOHN MICHIELS,DAVID WELLS,ERIC J.
KNAPPENBERGER,JAMES J. ALWAN
申请号：US09458758申请日：19991210
公开号：US20020076620A1公开日：20020620
专利附图：
摘要：The present invention includes structures, lithographic mask forming solutions,mask forming methods, field emission display emitter mask forming methods, and
methods of forming plural field emission display emitters. One aspect of the presentinvention provides a mask forming method including forming a masking layer over asurface of a substrate; screen printing plural masking particles over a surface of themasking layer; and removing at least portions of the masking layer using the maskingparticles as a mask. Another aspect of the present invention provides a method offorming plural field emission display emitters. This method includes forming a maskinglayer over an emitter substrate; screen printing a plurality of masking particles over themasking layer; removing portions of the masking layer intermediate the screen printedmasking particles to form a plurality of masking elements; removing the maskingparticles from the masking elements; and removing portions of the emitter substrate toform plural emitters.
申请人：MICHIELS JOHN,WELLS DAVID,KNAPPENBERGER ERIC J.,ALWAN JAMES J.
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容